X-Ray diffractometric techniques can be applied to
investigate a variety of material properties. Powder/bulk
analyses include phase identification and quantification
as well as atomic structure determinations. Thin film/surface
investigations include residual stress, texture (crystallographic
orientation), and reflectometry for atomic scale roughness
and void density determinations.
Three individually unique Philips goniometric systems,
on two separate generators, allow automated loading
and programming of 68 separate samples for unattended
24/7 data acquisition.
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Phase identification referenced to
a licensed annually updated international database
of > 131,000 phases |
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Advanced software data manipulation,
including several Rietveld packages, atomic modeling,
full profile fit, simulation, stress, texture, and
more |
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Crystallite size, lattice constants,
micro strain, residual stress, reflectometry |
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Cu k-alpha standard radiation source
(additional sources available) |
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100µm focal spot size monocapillary
collimator (small spot analysis on inhomogeneous
samples) |
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Spinning micro diffraction stage (small
powder quantities mounted in a glass capillary) |
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Diffracted beam monochromators and
sample spinners |
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Phi and Psi rotation open Eularian
cradle with z-translation and wafer (to 100 mm)
stage (stress, rocking curves, texture, reciprocal
space mapping) |
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Polycapillary incident lens with diffracted
beam collimator/flat monochromator for parallel
beam geometry |
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High resolution rocking curve analysis,
reciprocal space mapping and X-ray topography of
epitaxial layers on single crystal substrates |
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Incident monochromatic radiation with
hybrid mirror/2-crystal bounce optic |
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Transmission measurements through
thin foils
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